Boron Nitride Powder

Direct synthesis
The direct synthesis method is the direct synthesis of boron nitride from nitrogen and boron under high temperature and pressure. The reaction temperature of this method is usually between 1800-2000℃, the reaction pressure is 10-15kbar, and the raw materials used are pure elemental boron and nitrogen. At high temperatures and high pressure, nitrogen and boron directly react to produce boron nitride. The advantage of this method is that the reaction temperature and pressure are relatively low; the disadvantage is the need to use high-purity nitrogen and boron powder raw materials.

Pyrolysis method
Pyrolysis is the decomposition of boron-containing compounds into boron nitride and hydrogen at high temperatures. The reaction temperature of this method is usually between 1800-2200℃, and the raw materials used are boron-containing compounds, such as boron trichloride and eborane. At high temperatures, boron-containing compounds are decomposed into boron nitride, hydrogen, and chloride products, and pure boron nitride can be obtained after removing impurities such as chloride in the products. The advantage of this method is that boron-containing compounds are used as raw materials, which can reduce the cost. Still, the disadvantage is that the reaction temperature and pressure are high.

Nitriding
Nitriding is the infiltration of nitrogen into a metal or alloy to replace some of the atoms in the metal or alloy with nitrogen atoms to form nitrides. The reaction temperature of this method is usually between 750-1000 ° C, and the raw material used is metal or alloy. In the nitriding process, nitrogen atoms penetrate the metal or alloy to form nitride. The advantage of this method is that the content and properties of nitride can be controlled by controlling the nitride time and temperature, but the disadvantage is that the cost is high.

Ion implantation method
The ion implantation method is to inject an ion beam containing nitrogen and boron elements into a solid material through ion beam injection energy to make the surface of the solid material local heating and melt; at the same time, injected ions are fixed in the molten solid material, to form a dense boron nitride coating. The reaction temperature of this method is usually between 500 and 1000℃, and the raw material used is a boron nitride ion beam. In the ion implantation process, the solid surface is heated to a molten state, and the ion beam is injected to form a coating. The advantage of this method is that the thickness and properties of the coating can be controlled by controlling the ion implantation energy and dose. Still, the disadvantage is that the cost is higher.